Plasma density measurements of confined capacitively coupled plasma by microwave interferometer and ion energy distribution function methods. Helhel, S; Ellingboe, A.R; Cerezci, O; Gaman, C. International Journal of Infrared and Millimeter Waves 2006
NCPST develops and applies advanced plasma measurement techniques for detailed fundamental investigations as well as smart process monitoring and control technologies.
About the Research Area
Plasma diagnostics are important for measuring and monitoring species, mechanisms and for process control. These, often most powerful when combined with simulations, provide understanding and insight of the plasma environment. This understanding is a key element in the development of plasma control strategies and solutions for technological development. Sensing technologies are important for real time monitoring of processes.
Diagnostics in the plasma environment are not trivial and are under continuous development as knowledge and technology advances. Advanced diagnostic techniques often exploit new laser technologies, coupled with atomic and molecular physics understanding. Electrical plasma emission is also a powerful tool for plasma sensing and process control. Combining sensors or diagnostics with advanced data science techniques can additionally help provide greater insight into complex plasma systems.
Diagnostics and Sensors Publications
The evaluation of mechanical stresses developed in underlying silicon substrates due to electroless nickel under bump metallization using synchrotron X-ray topography. Noonan, D; McNally, P.J; Chen, W.-M; Lankinen, A; Knuuttila, L; Tuomi, T.O; Danilewsky, A.N; Simon, R. Microelectronics Journal 2006
An evaluation of an automated detection algorithm to count defects present in X-ray topographical images of SiC wafers. Brazil, I.C; McNally, P.J; O’Reilly, L; Danilewsky, A; Tuomi, T.O; Lankinen, A; Säynätjoki, A; Simon, R; Soloviev, S; Rowland, L.B; Sandvik, P.M. Materials Research Society Symposium Proceedings 2007