Diagnostics and Sensors

NCPST develops and applies advanced plasma measurement techniques for detailed fundamental investigations as well as smart process monitoring and control technologies.

About the Research Area

Plasma diagnostics are important for measuring and monitoring species, mechanisms and for process control. These, often most powerful when combined with simulations, provide understanding and insight of the plasma environment. This understanding is a key element in the development of plasma control strategies and solutions for technological development. Sensing technologies are important for real time monitoring of processes.
Diagnostics in the plasma environment are not trivial and are under continuous development as knowledge and technology advances. Advanced diagnostic techniques often exploit new laser technologies, coupled with atomic and molecular physics understanding. Electrical plasma emission is also a powerful tool for plasma sensing and process control. Combining sensors or diagnostics with advanced data science techniques can additionally help provide greater insight into complex plasma systems.

Diagnostics and Sensors Publications


Plasma density measurements of confined capacitively coupled plasma by microwave interferometer and ion energy distribution function methods. Helhel, S; Ellingboe, A.R; Cerezci, O; Gaman, C. International Journal of Infrared and Millimeter Waves 2006

Diagnostics for the dynamics of power dissipation in technologically used plasmas. Gans, T; O’Connell, D; Schulze, J; Kadetov, V.A; Czarnetzki, U. AIP Conference Proceedings 2006

The evaluation of mechanical stresses developed in underlying silicon substrates due to electroless nickel under bump metallization using synchrotron X-ray topography. Noonan, D; McNally, P.J; Chen, W.-M; Lankinen, A; Knuuttila, L; Tuomi, T.O; Danilewsky, A.N; Simon, R. Microelectronics Journal 2006

Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge. Schulze, J; Gans, T; O’Connell, D; Czarnetzki, U; Ellingboe, A.R; Turner, M.M. Journal of Physics D: Applied Physics 2007

Optical diagnostics of micro discharge jets. Schulz-Von Der Gathen, V; Buck, V; Gans, T; Knake, N; Niemi, K; Reuter, St; Schaper, L; Winter, J. Contributions to Plasma Physics 2007

A floating hairpin resonance probe technique for measuring time-resolved electron density in pulse discharge. Karkari, S.K; Gaman, C; Ellingboe, A.R; Swindells, I; Bradley, J.W. Measurement Science and Technology 2007

Plasma boundary sheath in the afterglow of a pulsed inductively coupled RF plasma. Osiac, M; Schwarz-Selinger, T; O’Connell, D; Heil, B; Petrovic, Z.Lj; Turner, M.M; Gans, T; Czarnetzki, U. Plasma Sources Science and Technology 2007

Electron density modulation in an asymmetric bipolar pulsed dc magnetron discharge. Karkari, S.K; Ellingboe, A.R; Gaman, C; Swindells, I; Bradley, J.W. Journal of Applied Physics 2007

An evaluation of an automated detection algorithm to count defects present in X-ray topographical images of SiC wafers. Brazil, I.C; McNally, P.J; O’Reilly, L; Danilewsky, A; Tuomi, T.O; Lankinen, A; Säynätjoki, A; Simon, R; Soloviev, S; Rowland, L.B; Sandvik, P.M. Materials Research Society Symposium Proceedings 2007

Spatially resolved diagnostics on a microscale atmospheric pressure plasma jet. Schulz-Von Der Gathen, V; Schaper, L; Knake, N; Reuter, S; Niemi, K; Gans, T; Winter, J. Journal of Physics D: Applied Physics 2008

Neutral gas depletion mechanisms in dense low-temperature argon plasmas. O’Connell, D; Gans, T; Crintea, D.L; Czarnetzki, U; Sadeghi, N. Journal of Physics D: Applied Physics 2008

The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma. O’Connell, D; Gans, T; Semmler, E; Awakowicz, P. Applied Physics Letters 2008

Spatial dynamics of the light emission from a microplasma array. Waskoenig, J; O’Connell, D; Schulz- Von Der Gathen, V; Winter, J; Park, S.-J; Eden, J.G. Applied Physics Letters 2008

Plasma dynamics in an inductively coupled magnetic neutral loop discharge. O’Connell, D; Gans, T; Crintea, D.L; Czarnetzki, U; Sadeghi, N. Plasma Sources Science and Technology 2008

Plasma ionization in low-pressure radio-frequency discharges – Part I: Optical measurements. O’Connell, D; Gans, T; Meige, A; Awakowicz, P; Boswell, R.W. IEEE Transactions on Plasma Science 2008

Measurement of electron density in a laser produced plasma using a hairpin resonance probe. Karkari, S.K; Doggett, B; Gaman, C; Donnelly, T; O’Farrell, D; Ellingboe, A.R; Lunney, J.G. Plasma Sources Science and Technology 2008

Handheld Flyback driven coaxial dielectric barrier discharge: Development and characterization. Law, V.J; Milosavljević, V; O’Connor, N; Lalor, J.F; Daniels, S. Review of Scientific Instruments 2008

White beam topography of 300 mm Si wafers. Danilewsky, A.N; Wittge, J; Rack, A; Weitkamp, T; Simon, R; Baumbach, T; McNally, P. Journal of Materials Science: Materials in Electronics 2008