Diagnostics and Sensors

NCPST develops and applies advanced plasma measurement techniques for detailed fundamental investigations as well as smart process monitoring and control technologies.

About the Research Area

Plasma diagnostics are important for measuring and monitoring species, mechanisms and for process control. These, often most powerful when combined with simulations, provide understanding and insight of the plasma environment. This understanding is a key element in the development of plasma control strategies and solutions for technological development. Sensing technologies are important for real time monitoring of processes.
Diagnostics in the plasma environment are not trivial and are under continuous development as knowledge and technology advances. Advanced diagnostic techniques often exploit new laser technologies, coupled with atomic and molecular physics understanding. Electrical plasma emission is also a powerful tool for plasma sensing and process control. Combining sensors or diagnostics with advanced data science techniques can additionally help provide greater insight into complex plasma systems.

Diagnostics and Sensors Publications


Real-time monitoring and control for high-efficiency autonomous laser fabrication of silicon nanoparticle colloids. Freeland, B; McCann, R; O’Neill, P; Sreenilayam, S; Tiefenthaler, M; Dabros, M; Juillerat, M; Foley, G; Brabazon, D. International Journal of Advanced Manufacturing Technology 2021

X-ray imaging of silicon die within fully packaged semiconductor devices. Tanner, B.K; McNally, P.J; Danilewsky, A.N. Powder Diffraction 2021

“nano”: An Emerging Avenue in Electrochemical Detection of Neurotransmitters. Madhurantakam, S; Karnam, J.B; Brabazon, D; Takai, M; Ahad, I.U; Balaguru Rayappan, J.B; Krishnan, U.M. ACS Chemical Neuroscience 2020

The formation of atomic oxygen and hydrogen in atmospheric pressure plasmas containing humidity: Picosecond two-photon absorption laser induced fluorescence and numerical simulations. Schröter, S; Bredin, J; Gibson, A.R; West, A; Dedrick, J.P; Wagenaars, E; Niemi, K; Gans, T; O’Connell, D. Plasma Sources Science and Technology 2020

Hard x-ray photoelectron spectroscopy study of copper formation by metal salt inclusion in a polymer film. Snelgrove, M; Mani-Gonzalez, P.G; Bogan, J; Lundy, R; Rueff, J.-P; Hughes, G; Yadav, P; McGlynn, E; Morris, M; O’Connor, R. Journal of Physics D: Applied Physics 2019

Fe2O3 sensor for breath gas sensing. Gaidan, I; Ahad, I.U; Brabazon, D. AIP Conference Proceedings 2019

Demonstration of an optical biosensor for the detection of faecal indicator bacteria in freshwater and coastal bathing areas. Briciu-Burghina, C; Heery, B; Duffy, G; Brabazon, D; Regan, F. Analytical and Bioanalytical Chemistry 2019

In-Operando X-ray diffraction imaging of thermal strains in fully packaged silicon devices. Tanner, B.K; Vijayaraghavan, R.K; Roarty, B; Danilewsky, A.N; McNally, P.J. Microelectronics Reliability 2019

Control of electron dynamics, radical and metastable species generation in atmospheric pressure RF plasma jets by Voltage Waveform Tailoring. Korolov, I; Donkó, Z; Hübner, G; Bischoff, L; Hartmann, P; Gans, T; Liu, Y; Mussenbrock, T; Schulze, J. Plasma Sources Science and Technology 2019

In situ synchrotron X-ray topography observation of double-ended Frank-Read sources in PVT-grown 4H-SiC wafers. Yang, Y; Guo, J; Raghothamachar, B; Dudley, M; Weit, S; Danilewsky, A.N; McNally, P.J; Tanner, B.K. Materials Science Forum 2018

Direct observation of stress relaxation process in 4H-SiC homoepitaxial layers via in situ synchrotron X-ray topography. Guo, J.Q; Yang, Y; Raghothamachar, B; Dudley, M; Weit, S; Danilewsky, A.N; McNally, P.J; Tanner, B.K. Materials Science Forum 2018

Experimental and computational investigations of electron dynamics in micro atmospheric pressure radio-frequency plasma jets operated in He/N 2 mixtures. Bischoff, L; Hübner, G; Korolov, I; Donkó, Z; Hartmann, P; Gans, T; Held, J; Schulz-Von Der Gathen, V; Liu, Y; Mussenbrock, T; Schulze, J. Plasma Sources Science and Technology 2018

Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases. Donkó, Z; Derzsi, A; Korolov, I; Hartmann, P; Brandt, S; Schulze, J; Berger, B; Koepke, M; Bruneau, B; Johnson, E; Lafleur, T; Booth, J.-P; Gibson, A.R; O’Connell, D; Gans, T. Plasma Physics and Controlled Fusion 2018

Electronegative plasma diagnostic by laser photo-detachment combined with negatively biased Langmuir probe. Oudini, N; Sirse, N; Taccogna, F; Ellingboe, A.R; Bendib, A. Physics of Plasmas 2018

A universal method for thermal conductivity measurements on micro-/nano-films with and without substrates using micro-Raman spectroscopy. Wight, N.M; Acosta, E; Vijayaraghavan, R.K; McNally, P.J; Smirnov, V; Bennett, N.S. Thermal Science and Engineering Progress 2017

TiO2 gas sensor to detect the propanol at room temperature. Gaidan, I; Asbia, S; Brabazon, D; Ahad, I.U. AIP Conference Proceedings 2017

Advanced characterisation techniques for nanostructures. Freeland, B; Ahad, I.U; Foley, G; Brabazon, D. Micro and Nanomanufacturing 2017

Nondestructive X-ray diffraction measurement of warpage in silicon dies embedded in integrated circuit packages. Tanner, B.K; Danilewsky, A.N; Vijayaraghavan, R.K; Cowleyc, A; McNally, P.J. Journal of Applied Crystallography 2017

Nondestructive, in Situ Mapping of Die Surface Displacements in Encapsulated IC Chip Packages Using X-Ray Diffraction Imaging Techniques. Gorji, N.E; Tanner, B.K; Vijayaraghavan, R.K; Danilewsky, A.N; McNally, P.J. Proceedings – Electronic Components and Technology Conference 2017

Quantitative imaging of the stress/strain fields and generation of macroscopic cracks from indents in silicon. Tanner, B.K; Allen, D; Wittge, J; Danilewsky, A.N; Garagorri, J; Gorostegui-Colinas, E; Elizalde, M.R; McNally, P.J. Crystals 2017

Investigation of the electron kinetics in O2 capacitively coupled plasma with the use of a Langmuir probe. Kechkar, S; Swift, P; Kelly, S; Kumar, S; Daniels, S; Turner, M. Plasma Sources Science and Technology 2017

Controlled production of atomic oxygen and nitrogen in a pulsed radio-frequency atmospheric-pressure plasma. Dedrick, J; Schröter, S; Niemi, K; Wijaikhum, A; Wagenaars, E; De Oliveira, N; Nahon, L; Booth, J.P; O’Connell, D; Gans, T. Journal of Physics D: Applied Physics 2017

Absolute ozone densities in a radio-frequency driven atmospheric pressure plasma using two-beam UV-LED absorption spectroscopy and numerical simulations. Wijaikhum, A; Schröder, D; Schröter, S; Gibson, A.R; Niemi, K; Friderich, J; Greb, A; Schulz-Von Der Gathen, V; O’Connell, D; Gans, T. Plasma Sources Science and Technology 2017

The role of thermal energy accommodation and atomic recombination probabilities in low pressure oxygen plasmas. Gibson, A.R; Foucher, M; Marinov, D; Chabert, P; Gans, T; Kushner, M.J; Booth, J.-P. Plasma Physics and Controlled Fusion 2017

In-situ surface and interface study of atomic oxygen modified carbon containing porous low-κ dielectric films for barrier layer applications. Bogan, J; Lundy, R; McCoy, A; O’Connor, R; Byrne, C; Walsh, L; Casey, P; Hughes, G. Journal of Applied Physics 2016

Chemical and electrical characterisation of the segregation of Al from a CuAl alloy (90%:10% wt) with thermal anneal. Byrne, C; Brady, A; Walsh, L; McCoy, A.P; Bogan, J; McGlynn, E; Rajani, K.V; Hughes, G. Thin Solid Films 2016