Diagnostics and Sensors

NCPST develops and applies advanced plasma measurement techniques for detailed fundamental investigations as well as smart process monitoring and control technologies.

About the Research Area

Plasma diagnostics are important for measuring and monitoring species, mechanisms and for process control. These, often most powerful when combined with simulations, provide understanding and insight of the plasma environment. This understanding is a key element in the development of plasma control strategies and solutions for technological development. Sensing technologies are important for real time monitoring of processes.
Diagnostics in the plasma environment are not trivial and are under continuous development as knowledge and technology advances. Advanced diagnostic techniques often exploit new laser technologies, coupled with atomic and molecular physics understanding. Electrical plasma emission is also a powerful tool for plasma sensing and process control. Combining sensors or diagnostics with advanced data science techniques can additionally help provide greater insight into complex plasma systems.

Diagnostics and Sensors Publications


Protection and functionalisation of silver as an optical sensing platform for highly sensitive SPR based analysis. Manickam, G; Gandhiraman, R; Vijayaraghavan, R.K; Kerr, L; Doyle, C; Williams, D.E; Daniels, S. Analyst 2012

Two-photon absorption laser-induced fluorescence measurements of atomic nitrogen in a radio-frequency atmospheric-pressure plasma jet. Wagenaars, E; Gans, T; O’Connell, D; Niemi, K. Plasma Sources Science and Technology 2012

Ion energy distribution measurements in rf and pulsed dc plasma discharges. Gahan, D; Daniels, S; Hayden, C; Scullin, P; O’Sullivan, D; Pei, Y.T; Hopkins, M.B. Plasma Sources Science and Technology 2012

Characterization of an asymmetric parallel plate radio-frequency discharge using a retarding field energy analyzer. Gahan, D; Daniels, S; Hayden, C; O’Sullivan, D.O; Hopkins, M.B. Plasma Sources Science and Technology 2012

Detection of atomic oxygen and nitrogen created in a radio-frequency-driven micro-scale atmospheric pressure plasma jet using mass spectrometry. Maletić, D; Puač, N; Lazović, S; Malović, G; Gans, T; Schulz-Von Der Gathen, V; Petrović, Z.L. Plasma Physics and Controlled Fusion 2012

Citrate-capped gold nanoparticle electrophoretic heat production in response to a time-varying radio-frequency electric field. Corr, S.J; Raoof, M; MacKeyev, Y; Phounsavath, S; Cheney, M.A; Cisneros, B.T; Shur, M; Gozin, M; McNally, P.J; Wilson, L.J; Curley, S.A. Journal of Physical Chemistry C 2012

A distributed real time sensor network for enhancing energy efficiency through ICT. Yang, J; Phelan, S; Meehan, P; Daniels, S. IET Conference Publications 2012

Prediction of the propagation probability of individual cracks in brittle single crystal materials. Tanner, B.K; Fossati, M.C; Garagorri, J; Elizalde, M.R; Allen, D; McNally, P.J; Jacques, D; Wittge, J; Danilewsky, A.N. Applied Physics Letters 2012

A novel X-ray diffraction technique for analysis of die stress inside fully encapsulated packaged chips. Wong, C.S; Bennett, N; Allen, D; Danilewsky, A; McNally, P. 2012 4th Electronic System-Integration Technology Conference, ESTC 2012 2012

Influence of mechanical defects on the crystal lattice of silicon. Jauß, T; Danilewsky, A.N; Wittge, J; Cröll, A; Garagorri, J; Elizalde, R.M; Allen, D; McNally, P. Crystal Research and Technology 2012

Nanosecond optical imaging spectroscopy of an electrothermal radiofrequency plasma thruster plume. Charles, C; Dedrick, J; Boswell, R.W; O’Connell, D; Gans, T. Applied Physics Letters 2013

Phase-resolved optical emission spectroscopy for an electron cyclotron resonance etcher. Milosavljević, V; Macgearailt, N; Cullen, P.J; Daniels, S; Turner, M.M. Journal of Applied Physics 2013

Soft x-ray spectroscopic investigation of Zn doped CuCl produced by pulsed dc magnetron sputtering. Rajani, K.V; Daniels, S; McNally, P.J; Krishnamurthy, S. Journal of Physics Condensed Matter 2013