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Diagnostics and Sensors - NCPST - Page 5

Diagnostics and Sensors

NCPST develops and applies advanced plasma measurement techniques for detailed fundamental investigations as well as smart process monitoring and control technologies.

About the Research Area

Plasma diagnostics are important for measuring and monitoring species, mechanisms and for process control. These, often most powerful when combined with simulations, provide understanding and insight of the plasma environment. This understanding is a key element in the development of plasma control strategies and solutions for technological development. Sensing technologies are important for real time monitoring of processes.
Diagnostics in the plasma environment are not trivial and are under continuous development as knowledge and technology advances. Advanced diagnostic techniques often exploit new laser technologies, coupled with atomic and molecular physics understanding. Electrical plasma emission is also a powerful tool for plasma sensing and process control. Combining sensors or diagnostics with advanced data science techniques can additionally help provide greater insight into complex plasma systems.

Diagnostics and Sensors Publications

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Space and phase resolved optical emission in mode transitions of radio-frequency inductively coupled plasmas. O’Connell, D; Niemi, K; Zaka-Ul-Islam, M; Gans, T. Journal of Physics: Conference Series 2009

Visualisation of atmospheric pressure plasma electrical parameters. Law, V.J; O’Connor, N; Daniels, S; Twomey, B; Tynan, J; Dowling, D.P; Byrne, G. Topics on Chaotic Systems – Selected Papers from CHAOS 2008 International Conference 2009

Evaluation of real-time non-invasive diagnostic tools for the monitoring of a pilot scale atmospheric pressure plasma system. Tynan, J; Law, V.J; Twomey, B; Hynes, A.M; Daniels, S; Byrne, G; Dowling, D.P. Measurement Science and Technology 2009

Synchrotron topography and X-ray diffraction study of GaInP layers grown on GaAs/Ge. Lankinen, A; Knuuttila, L; Kostamo, P; Tuomi, T.O; Lipsanen, H; McNally, P.J; O’Reilly, L. Journal of Crystal Growth 2009

Acoustic emission within an atmospheric helium discharge jet. Law, V.J; Nwankire, C.E; Dowling, D.P; Daniels, S. 3rd Chaotic Modeling and Simulation International Conference, CHAOS 2010 2010

Diagnostic based modelling of radio-frequency driven atmospheric pressure plasmas. Niemi, K; Reuter, S; Graham, L.M; Waskoenig, J; Knake, N; Schulz-Von Der Gathen, V; Gans, T. Journal of Physics D: Applied Physics 2010

Reactive amine surfaces for biosensor applications, prepared by plasma-enhanced chemical vapour modification of polyolefin materials. Volcke, C; Gandhiraman, R.P; Gubala, V; Raj, J; Cummins, Th; Fonder, G; Nooney, R.I; Mekhalif, Z; Herzog, G; Daniels, S; Arrigan, D.W.M; Cafolla, A.A; Williams, D.E. Biosensors and Bioelectronics 2010

Using the resonance hairpin probe and pulsed photodetachment technique as a diagnostic for negative ions in oxygen plasma. Conway, J; Sirse, N; Karkari, S.K; Turner, M.M. Plasma Sources Science and Technology 2010

Comparison of pilot and industrial scale atmospheric pressure glow discharge systems including a novel electro-acoustic technique for process monitoring. Tynan, J; Law, V.J; Ward, P; Hynes, A.M; Cullen, J; Byrne, G; Daniels, S; Dowling, D.P. Plasma Sources Science and Technology 2010

Excitation dynamics of micro-structured atmospheric pressure plasma arrays. Boettner, H; Waskoenig, J; O’Connell, D; Kim, T.L; Tchertchian, P.A; Winter, J; Schulz-Von Der Gathen, V. Journal of Physics D: Applied Physics 2010

Diagnostic-based modeling on a micro-scale atmospheric-pressure plasma jet. Waskoenig, J; Niemi, K; Knake, N; Graham, L.M; Reuter, S; Schulz-Von Der Gathen, V; Gans, T. Pure and Applied Chemistry 2010

Hairpin probe in conjunction with laser photo-detachment technique for negative ion density measurement. Sirse, N; Conway, J; Karkari, S.K; Turner, M.M. 37th EPS Conference on Plasma Physics 2010, EPS 2010 2010

Observation of nano-indent induced strain fields and dislocation generation in silicon wafers using micro-Raman spectroscopy and white beam X-ray topography. Allen, D; Wittge, J; Zlotos, A; Gorostegui-Colinas, E; Garagorri, J; McNally, P.J; Danilewsky, A.N; Elizalde, M.R. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 2010

Dislocation generation related to micro-cracks in Si wafers: High temperature in situ study with white beam X-ray topography. Danilewsky, A; Wittge, J; Hess, A; Cröll, A; Allen, D; McNally, P; Vagovič, P; Cecilia, A; Li, Z; Baumbach, T; Gorostegui-Colinas, E; Elizalde, M.R. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 2010

Dislocation sources and slip band nucleation from indents on silicon wafers. Wittge, J; Danilewsky, A.N; Allen, D; McNally, P; Li, Z; Baumbach, T; Gorostegui-Colinas, E; Garagorri, J; Elizalde, M.R; Jacques, D; Fossati, M.C; Bowen, D.K; Tanner, B.K. Journal of Applied Crystallography 2010

X-ray diffraction imaging of dislocation generation related to microcracks in Si wafers. Wittge, J; Danilewsky, A; Allen, D; McNally, P; Li, Z.J; Baumbach, T; Gorostegui-Colinas, E; Garagorri, J; Elizalde, M.R; Jacques, D; Fossati, M.C; Bowen, D.K; Tanner, B.K. Powder Diffraction 2010

The temporal evolution in plasma potential during laser photo-detachment used to diagnose electronegative plasma. Sirse, N; Karkari, S.K; Mujawar, M.A; Conway, J; Turner, M.M. Plasma Sources Science and Technology 2011

Passive acoustic diagnostics of an atmospheric pressure linear field jet including analysis in the time-frequency domain. O’Connor, N; Daniels, S. Journal of Applied Physics 2011

Development of a real time monitor and multivariate method for long term diagnostics of atmospheric pressure dielectric barrier discharges: Application to He, He/N2, and He/O2 discharges. O’Connor, N; Milosavljevi, V; Daniels, S. Review of Scientific Instruments 2011

Raman scattering analysis of silicon dioxide single crystal treated by direct current plasma discharge. Popovic, D.M; Milosavljevic, V; Zekic, A; Romcevic, N; Daniels, S. Applied Physics Letters 2011

Dislocation dynamics and slip band formation in silicon: In-situ study by X-ray diffraction imaging. Danilewsky, A.N; Wittge, J; Croell, A; Allen, D; McNally, P; Vagovič, P; Dos Santos Rolo, T; Li, Z; Baumbach, T; Gorostegui-Colinas, E; Garagorri, J; Elizalde, M.R; Fossati, M.C; Bowen, D.K; Tanner, B.K. Journal of Crystal Growth 2011

Thermal slip sources at the extremity and bevel edge of silicon wafers. Tanner, B.K; Wittge, J; Allen, D; Fossati, M.C; Danilwesky, A.N; McNally, P; Garagorri, J; Elizalde, M.R; Jacques, D. Journal of Applied Crystallography 2011

Real-time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments. Danilewsky, A.N; Wittge, J; Hess, A; Cröll, A; Rack, A; Allen, D; McNally, P; Dos Santos Rolo, T; Vagovič, P; Baumbach, T; Garagorri, J; Elizalde, M.R; Tanner, B.K. Physica Status Solidi (A) Applications and Materials Science 2011

Combined use of three-dimensional X-ray diffraction imaging and micro-Raman spectroscopy for the non-destructive evaluation of plasma arc induced damage on silicon wafers. Stopford, J; Allen, D; Aldrian, O; Morshed, M; Wittge, J; Danilewsky, A.N; McNally, P.J. Microelectronic Engineering 2011

Three-dimensional X-ray diffraction imaging of process-induced dislocation loops in silicon. Allen, D; Wittge, J; Stopford, J; Danilewsky, A; McNally, P. Journal of Applied Crystallography 2011