Low-temperature Plasmas

Our low-temperature plasma research develops solutions for global challenges in high-tech manufacturing, environment, and medicine, through coupling advanced plasma sensing with simulations.

About the Research Area

Low-temperature plasmas (LTPs) have the ability to generate and deliver reactive atomic and molecular species, UV, charged particles, and electric fields to biological targets under ambient conditions. LTPs can stimulate specific biological responses by producing Reactive Oxygen and Nitrogen Species (RONS), which mediate many physiological processes such as cell-to-cell signalling, immune response, wound healing, and cell death. These plasma-produced species are expected to mimic the functions of their native counterparts and offer unique synergies capable of stimulating specific biological responses. Our research focuses on understanding the plasma-driven mechanisms of action and engineering controllable plasma delivery strategies to enhance clinical therapies. We collaborate with many partners on this theme.

Low-temperature Plasmas Publications

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External circuit system effects on chlorine plasma instabilities. Ellingboe, A.R; Law, V.J; Soberon, F; Garcia, F; Graham, W. Electronics Letters 2005

Characterization of stationary and pulsed inductively coupled RF discharges for plasma sterilization. Gans, T; Osiac, M; O’Connell, D; Kadetov, V.A; Czarnetzki, U; Schwarz-Selinger, T; Halfmann, H; Awakowicz, P. Plasma Physics and Controlled Fusion 2005

Space and time resolved rotational state populations and gas temperatures in an inductively coupled hydrogen RF discharge. Abdel-Rahman, M; Gans, T; Schulz-Von Der Gathen, V; Döbele, H.F. Plasma Sources Science and Technology 2005

One-dimensional simulation of an ion beam generated by a current-free double-layer. Meige, A; Boswell, R.W; Charles, C; Boeuf, J.-P; Hagelaar, G; Turner, M.M. IEEE Transactions on Plasma Science 2005

Phase and space resolved optical emission spectroscopic investigations of an inductively coupled RF plasma using an imaging acousto-optic spectrometer. Kampschulte, T; Schulze, J; Gans, T; Czarnetzki, U; Marke, S; Wallendorf, T. Surface and Coatings Technology 2005

Negative ion yield in long pulse operation of the KAMABOKO III source. Boilson, D; Ellingboe, A.R; Faulkner, R; Hemsworth, R.S; De Esch, H.P.L; Krylov, A; Massmann, P; Svensson, L. Fusion Engineering and Design 2005

Instabilities and pattern formation in low temperature plasmas. MacKey, D; Plantié, L; Turner, M.M. Applied Mathematics Letters 2005

Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas. Gans, T; Schulze, J; O’Connell, D; Czarnetzki, U; Faulkner, R; Ellingboe, A.R; Turner, M.M. Applied Physics Letters 2006

Effect of radio-frequency power levels on electron density in a confined two-frequency capacitively-coupled plasma processing tool. Karkari, S.K; Ellingboe, A.R. Applied Physics Letters 2006

Electron heating mode transitions in dual frequency capacitive discharges. Turner, M.M; Chabert, P. Applied Physics Letters 2006

Influence of plasma parameters on the chemical composition of steady-state fluorocarbon films deposited on carbon-doped low-k dielectric layers during etching. Reid, I; Hughes, G. Semiconductor Science and Technology 2006

Ion flow and sheath physics studies in multiple ion species plasmas using diode laser based laser-induced fluorescence. Severn, G.D; Wang, X; Ko, E; Hershkowitz, N; Turner, M.M; McWilliams, R. Thin Solid Films 2006

Chlorine plasma system instabilities within an ICP tool driven at a frequency of 13.56 MHz. Soberón, F; Marro, F.G; Graham, W.G; Ellingboe, A.R; Law, V.J. Plasma Sources Science and Technology 2006

Plasma density measurements of confined capacitively coupled plasma by microwave interferometer and ion energy distribution function methods. Helhel, S; Ellingboe, A.R; Cerezci, O; Gaman, C. International Journal of Infrared and Millimeter Waves 2006

Diagnostics for the dynamics of power dissipation in technologically used plasmas. Gans, T; O’Connell, D; Schulze, J; Kadetov, V.A; Czarnetzki, U. AIP Conference Proceedings 2006

Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge. Schulze, J; Gans, T; O’Connell, D; Czarnetzki, U; Ellingboe, A.R; Turner, M.M. Journal of Physics D: Applied Physics 2007

Optical diagnostics of micro discharge jets. Schulz-Von Der Gathen, V; Buck, V; Gans, T; Knake, N; Niemi, K; Reuter, St; Schaper, L; Winter, J. Contributions to Plasma Physics 2007

A floating hairpin resonance probe technique for measuring time-resolved electron density in pulse discharge. Karkari, S.K; Gaman, C; Ellingboe, A.R; Swindells, I; Bradley, J.W. Measurement Science and Technology 2007