The challenge of revealing and tailoring the dynamics of radio-frequency plasmas. Gans, T; O’Connell, D; Schulz-Von Der Gathen, V; Waskoenig, J. Plasma Sources Science and Technology 2010
Our low-temperature plasma research develops solutions for global challenges in high-tech manufacturing, environment, and medicine, through coupling advanced plasma sensing with simulations.
About the Research Area
Low-temperature plasmas (LTPs) have the ability to generate and deliver reactive atomic and molecular species, UV, charged particles, and electric fields to biological targets under ambient conditions. LTPs can stimulate specific biological responses by producing Reactive Oxygen and Nitrogen Species (RONS), which mediate many physiological processes such as cell-to-cell signalling, immune response, wound healing, and cell death. These plasma-produced species are expected to mimic the functions of their native counterparts and offer unique synergies capable of stimulating specific biological responses. Our research focuses on understanding the plasma-driven mechanisms of action and engineering controllable plasma delivery strategies to enhance clinical therapies. We collaborate with many partners on this theme.
Low-temperature Plasmas Publications
Reactive amine surfaces for biosensor applications, prepared by plasma-enhanced chemical vapour modification of polyolefin materials. Volcke, C; Gandhiraman, R.P; Gubala, V; Raj, J; Cummins, Th; Fonder, G; Nooney, R.I; Mekhalif, Z; Herzog, G; Daniels, S; Arrigan, D.W.M; Cafolla, A.A; Williams, D.E. Biosensors and Bioelectronics 2010
The influence of the relative phase between the driving voltages on electron heating in asymmetric dual frequency capacitive discharges. Ziegler, D; Trieschmann, J; Mussenbrock, T; Brinkmann, R.P; Schulze, J; Czarnetzki, U; Semmler, E; Awakowicz, P; O’Connell, D; Gans, T. Plasma Sources Science and Technology 2010
Real-time control of electron density in low pressure plasma. Zhang, Y; Holohan, A; Keville, B; Daniels, S. European Conference of Chemical Engineering, ECCE’10, European Conference of Civil Engineering, ECCIE’10, European Conference of Mechanical Engineering, ECME’10, European Conference of Control, ECC’10 2010
Characterisation of thin film silicon films deposited by plasma enhanced chemical vapour deposition at 162 MHz, using a large area, scalable, multi-tile-electrode plasma source. Monaghan, E; Michna, T; Gaman, C; O’Farrel, D; Ryan, K; Adley, D; Perova, T.S; Drews, B; Jaskot, M; Ellingboe, A.R. Thin Solid Films 2011