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Materials Growth and Processing - NCPST - Page 9

Materials Growth and Processing

Our materials growth and processing research develops novel materials and processing methods directed towards applications in high-tech microelectronics, sensing, and sustainability, working in collaboration with key industrial and scientific partners.

About the Research Area

Novel materials coupled with precision processing techniques enable unique functional devices on sub-micron and nanometre length scales. The ability to work at the interface of materials growth and processing, and to utilise a wide variety of processing techniques, including non-equilibrium plasma methods, enables us to access a broad range of parameter space and to develop innovative new materials, composites and structures suited to specific applications. Our wide range of analysis and characterisation techniques provide us with detailed understanding of the scientific basis of the material and device behaviour and these techniques are designed to maximise their relevance to the high-tech manufacturing sector by replicating industrial conditions to give our work maximum impact.

Research Projects

Materials Growth and Processing Publications

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Simultaneous extraction of recoverable and permanent components contributing to bias-temperature instability. Grasser, T; Kaczer, B; Hehenberger, P; Gös, W; O’Connor, R; Reisinger, H; Gustin, W; Schlünder, C. Technical Digest – International Electron Devices Meeting, IEDM 2007

Frequency dispersion reduction and bond conversion on n -type GaAs by in situ surface oxide removal and passivation. Hinkle, C.L; Sonnet, A.M; Vogel, E.M; McDonnell, S; Hughes, G.J; Milojevic, M; Lee, B; Aguirre-Tostado, F.S; Choi, K.J; Kim, J; Wallace, R.M. Applied Physics Letters 2007

Characterisation and passivation of interface defects in (1 0 0)-Si/SiO2/HfO2/TiN gate stacks. Hurley, P.K; Cherkaoui, K; McDonnell, S; Hughes, G; Groenland, A.W. Microelectronics Reliability 2007

A Dy2O3-capped HfO2 dielectric and TaCx-based metals enabling low-Vt single-metal-single- dielectric gate stack. Chang, V.S; Ragnarsson, L.-Å; Pourtois, G; O’Connor, R; Adelmann, C; Van Elshocht, S; Delabie, A; Swerts, J; Van Der Heyden, N; Conard, T; Cho, H.-J; Akheyar, A; Mitsuhashi, R; Witters, T; O’Sullivan, B.J; Pantisano, L; Rohr, E; Lehnen, P; Kubicek, S; Schram, T; De Gendt, S; Absil, P.P; Biesemans, S. Technical Digest – International Electron Devices Meeting, IEDM 2007

Tuning PMOS Mo(O,N) metal gates to NMOS by addition of DyO capping layer. Petry, J; Singanamalla, R; Xiong, K; Ravit, C; Simoen, E; O’Connor, R; Veloso, A; Adelmann, C; Van Elshocht, S; Paraschiv, V; Brus, S; Van Berkum, J; Kubicek, S; De Meyer, K; Biesemans, S; Hooker, J.C. Technical Digest – International Electron Devices Meeting, IEDM 2007

Evaluation of the chemical, electronic and optoelectronic properties of γ-CuCl thin films and their fabrication on Si substrates. Lucas, F.O; Mitra, A; McNally, P.J; Daniels, S; Bradley, A.L; Taylor, D.M; Proskuryakov, Y.Y; Durose, K; Cameron, D.C. Journal of Physics D: Applied Physics 2007

Towards the fabrication of a UV light source based on CuCl thin films. Mitra, A; Lucas, F.O; O’Reilly, L; McNally, P.J; Daniels, S; Natarajan, G. Journal of Materials Science: Materials in Electronics 2007

Characterisation of n-type γ-CuCl on Si for UV optoelectronic applications. O’Reilly, L; Mitra, A; Lucas, F.O; Natarajan, G; McNally, P.J; Daniels, S; Lankinen, A; Lowney, D; Bradley, A.L; Cameron, D.C. Journal of Materials Science: Materials in Electronics 2007

4H-SiC epitaxial layers grown on on-axis Si-face substrate. Hassan, J; Bergman, J.P; Henry, A; Pedersen, H; McNally, P.J; Janzén, E. Materials Science Forum 2007

An x-ray topographic analysis of the crystal quality of globally available SiC wafers. Brazil, I; McNally, P.J; Ren, N; O’Reilly, L; Danilewsky, A; Tuomi, T.O; Lankinen, A; Säynätjaki, A; Simon, R; Soloviev, S; Rowland, L.B; Sandvik, P.M. Materials Science Forum 2007

An X-ray topographic analysis of the crystal quality of globally ayailable SiC wafers. Brazil, I; McNally, P.J; Ren, N; O’Reilly, L; Danilewsky, A; Tuomi, T.O; Lankinen, A; Säynätjaki, A; Simon, R; Soloviev, S; Rowland, L.B; Sandvik, P.M. Materials Science Forum 2007

Preparation and temperature cycling reliability of electroless Ni(P) under bump metallization. Chen, W.-M; McCloskey, P; Rohan, J.F; Byrne, P; McNally, P.J. IEEE Transactions on Components and Packaging Technologies 2007

Self-organized ZnAl2O4 nanostructures grown on c-sapphire. Grabowska, J; Nanda, K.K; Rajendra Kumar, R.T; Mosnier, J.P; Henry, M.O; Newcomb, S.B; McNally, P; O’Reilly, L; Lu, X; McGlynn, E. Superlattices and Microstructures 2007

Influence of target to substrate distance on the sputtered CuCl film properties. Natarajan, G; Daniels, S; Cameron, D.C; McNally, P.J. Thin Solid Films 2008

Optical properties of CuCl films on silicon substrates. Mitra, A; O’Reilly, L; Lucas, O.F; Natarajan, G; Danieluk, D; Bradley, A.L; McNally, P.J; Daniels, S; Cameron, D.C; Reader, A; Martinez-Rosas, M. Physica Status Solidi (B) Basic Research 2008

Temperature dependent optical properties of UV emitting γ-CuCl thin films. Natarajan, G; Mitra, A; Daniels, S; Cameron, D.C; McNally, P.J. Thin Solid Films 2008

Morphological, optical and electrical properties of γ CuCl deposited by vacuum evaporation. Lucas, F.O; Mitra, A; McNally, P.J; O’Reilly, L; Daniels, S; Natarajan, G; Durose, K; Proskuryakov, Y.Y; Cameron, D.C. Journal of Materials Science: Materials in Electronics 2008

Growth of ZnO nanostructures on Au-coated Si: Influence of growth temperature on growth mechanism and morphology. Kumar, R.T.R; McGlynn, E; Biswas, M; Saunders, R; Trolliard, G; Soulestin, B; Duclere, J.-R; Mosnier, J.P; Henry, M.O. Journal of Applied Physics 2008

In-situ optical reflectance and synchrotron X-ray topography study of defects in epitaxial dilute GaAsN on GaAs. Reentilä, O; Lankinen, A; Mattila, M; Säynätjoki, A; Tuomi, T.O; Lipsanen, H; O’Reilly, L; McNally, P.J. Journal of Materials Science: Materials in Electronics 2008

Growth and characterisation of epitaxially ordered zinc aluminate domains on c-sapphire. Grabowska, J; Rajendra Kumar, R.T; McGlynn, E; Nanda, K.K; Newcomb, S.B; McNally, P.J; O’Reilly, L; Mosnier, J.-P; Henry, M.O. Thin Solid Films 2008

X-ray excited optical luminescence of Mg-doped GaN. Lankinen, A; Svensk, O; Mattila, M; Tuomi, T.O; Lipsanen, H; McNally, P.J; O’Reilly, L; Paulmann, C. Journal of X-Ray Science and Technology 2008

Growth and characterisation of thin MgO layers on Si(100) surfaces. Casey, P; Hughes, G; O’connor, E; Long, R.D; Hurley, P.K. Journal of Physics: Conference Series 2008

Dislocations at the interface between sapphire and GaN. Lankinen, A; Lang, T; Suihkonen, S; Svensk, O; Säynätjoki, A; Tuomi, T.O; McNally, P.J; Odnoblyudov, M; Bougrov, V; Danilewsky, A.N; Bergman, P; Simon, R. Journal of Materials Science: Materials in Electronics 2008

Laser surface modification of tool steel for semi-solid steel forming. Brabazon, D; Naher, S; Biggs, P. Solid State Phenomena 2008

Glazing of tool dies for semi-solid steel forming. Brabazon, D; Naher, S; Biggs, P. International Journal of Material Forming 2008

Displacement of charge and conduction current in collisionless planar sheaths during voltage transients. Braithwaite, N.St.J; LauroTaroni, L; Haas, F.A; Turner, M.M. Contributions to Plasma Physics 2008

GaAs interfacial self-cleaning by atomic layer deposition. Hinkle, C.L; Sonnet, A.M; Vogel, E.M; McDonnell, S; Hughes, G.J; Milojevic, M; Lee, B; Aguirre-Tostado, F.S; Choi, K.J; Kim, H.C; Kim, J; Wallace, R.M. Applied Physics Letters 2008