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Modelling and Simulation - NCPST

Modelling and Simulation

Computational techniques for describing and predicting plasma properties. Accurate and well benchmarked simulations and models can predict new power coupling and distribution mechanisms, excitation schemes and configurations. 

About the Research Area

Plasma modelling and simulations are essential tools in the field of plasmas, helping us understand and predict the behaviour of plasmas in various applications, from fusion energy to plasma processing. By utilising mathematical models and computer simulations, we can gain insight into the complex and dynamic behaviour of plasmas and develop new techniques and technologies to manipulate and control them. Plasma modelling and simulation techniques include particle-in-cell (PIC) simulations, fluid simulations and hybrid models, each with its own advantages and limitations for different types of plasma applications. Plasma simulations coupled with diagnostics are particularly powerful in gaining a more complete understanding of plasma behaviour, and thus optimise plasma sources and develop new plasma-based technologies.

Modelling and Simulation Publications

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Effects of excitation voltage pulse shape on the characteristics of atmospheric-pressure nanosecond discharges. Donkó, Z; Hamaguchi, S; Gans, T. Plasma Sources Science and Technology 2019

Experimental and computational investigations of electron dynamics in micro atmospheric pressure radio-frequency plasma jets operated in He/N 2 mixtures. Bischoff, L; Hübner, G; Korolov, I; Donkó, Z; Hartmann, P; Gans, T; Held, J; Schulz-Von Der Gathen, V; Liu, Y; Mussenbrock, T; Schulze, J. Plasma Sources Science and Technology 2018

Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases. Donkó, Z; Derzsi, A; Korolov, I; Hartmann, P; Brandt, S; Schulze, J; Berger, B; Koepke, M; Bruneau, B; Johnson, E; Lafleur, T; Booth, J.-P; Gibson, A.R; O’Connell, D; Gans, T. Plasma Physics and Controlled Fusion 2018

Calculated electron impact dissociation cross sections for molecular chlorine (Cl2). Hamilton, J.R; Tennyson, J; Booth, J.-P; Gans, T; Gibson, A.R. Plasma Sources Science and Technology 2018

Concepts, Capabilities, and Limitations of Global Models: A Review. Hurlbatt, A; Gibson, A.R; Schröter, S; Bredin, J; Foote, A.P.S; Grondein, P; O’Connell, D; Gans, T. Plasma Processes and Polymers 2017

QDB: A new database of plasma chemistries and reactions. Tennyson, J; Rahimi, S; Hill, C; Tse, L; Vibhakar, A; Akello-Egwel, D; Brown, D.B; Dzarasova, A; Hamilton, J.R; Jaksch, D; Mohr, S; Wren-Little, K; Bruckmeier, J; Agarwal, A; Bartschat, K; Bogaerts, A; Booth, J.-P; Goeckner, M.J; Hassouni, K; Itikawa, Y; Braams, B.J; Krishnakumar, E; Laricchiuta, A; Mason, N.J; Pandey, S; Petrovic, Z.L; Pu, Y.-K; Ranjan, A; Rauf, S; Schulze, J; Turner, M.M; Ventzek, P; Whitehead, J.C; Yoon, J.-S. Plasma Sources Science and Technology 2017

Bridging the gap between global models and full fluid models: A fast 1D semi-analytical fluid model for electronegative plasmas. Hurlbatt, A; O’Connell, D; Gans, T. Plasma Sources Science and Technology 2016

Two-Dimensional Integrated Model for Interaction of Liquid Droplets with Atmospheric Pressure Plasma. Iqbal, M.M; Stallard, C.P; Dowling, D.P; Turner, M.M. Plasma Processes and Polymers 2015

Tailoring the nonlinear frequency coupling between odd harmonics for the optimisation of charged particle dynamics in capacitively coupled oxygen plasmas. Gibson, A.R; Greb, A; Graham, W.G; Gans, T. Applied Physics Letters 2015

Numerical experiment to estimate the validity of negative ion diagnostic using photo-detachment combined with Langmuir probing. Oudini, N; Sirse, N; Benallal, R; Taccogna, F; Aanesland, A; Bendib, A; Ellingboe, A.R. Physics of Plasmas 2015

Equivalence of the hard-wall and kinetic-fluid models of collisionless electron heating in capacitively coupled discharges. Lafleur, T; Chabert, P; Turner, M.M; Booth, J.P. Plasma Sources Science and Technology 2014

Investigation of absolute atomic fluorine density in a capacitively coupled SF6/O2/Ar and SF6/Ar discharge. Kechkar, S; Babu, S.K; Swift, P; Gaman, C; Daniels, S; Turner, M. Plasma Sources Science and Technology 2014