Alshaltami, KA; Daniels, S. Investigation of etching optimization in capacitively coupled SF6-O-2 plasma. AIP Advances, 9(3), Article 35047. DOI: 10.1063/1.5066286
Alshaltami, KA; Daniels, S. Investigation of etching optimization in capacitively coupled SF6-O-2 plasma. AIP Advances, 9(3), Article 35047. DOI: 10.1063/1.5066286